Reticle protection member, reticle carrying device, exposure device and method for carrying reticle

ABSTRACT

A position measurement device  29  measures the position of a position measurement mark  26  formed on the lower surface of a reticle  1 , thereby measuring the position of the reticle  1 . A position measurement device  30  measures the position of the position measurement mark  27  formed on the lower surface of a lower lid  2   b , thereby measuring the position of the lower lid  2   b . The relative displacement of the reticle  1  and lower lid  2   b  is known when the position of the reticle  1  and the position of the lower lid  2   b  are known. Therefore, when the lower lid  2   b  having the reticle  1  loaded thereon is carried with a carrying device and set in an exposure device, the stop position of the lower lid  2   b  is determined by taking this displacement into account. As a result, the reticle  1  can be correctly set in the exposure device.

This is a continuation of application Ser. No. 11/235,198, filed on Sep.27, 2005 now U.S. Pat. No. 7,453,549, which is herein incorporated byreference.

BACKGROUND OF THE INVENTION

The present invention relates to a reticle protection member, areticle-carrying device, an exposure device, and a method for carrying areticle, with specific advantageous applications to EUV exposuredevices.

Following recent miniaturization of semiconductor integrated circuits,projection lithography technology using EUV light with a shorterwavelength (11-14 nm) instead of conventional ultraviolet radiation hasbeen developed with the object of increasing the resolution of opticalsystems restricted by a light diffraction limit. This technology hasrecently been called EUV (Extreme UltraViolet) lithography and it isexpected to provide a resolution of 70 nm or less that could not berealized with conventional optical lithography using light radiationwith a wavelength of about 190 nm.

A complex index of refraction, n, of a substance in a wavelength regionof the EUV light is represented by n=1−δ−ik (i is a complex symbol). Theimaginary portion k of this index of refraction represents absorption byextreme ultraviolet radiation. Because δ and k are much smaller than 1,the index of refraction in this region is very close to 1. Therefore, anoptical system using reflection can be employed without using theconventional optical elements of a transmission refraction type such aslenses.

FIG. 12 is a general view of such an EUV exposure device. EUV light 32emitted from an EUV light source 31 enters an illumination opticalsystem 33, becomes an almost parallel light flux after being reflectedby a concave reflective mirror 34 acting as a collimator mirror, andenters an optical integrator 35 comprising a pair of fly-eye mirrors 35a and 35 b. For example, fly-eye mirrors disclosed in U.S. Pat. No.6,452,661 can be used as the pair of fly-eye mirrors 35 a and 35 b. Thestructure and operation of fly-eye mirrors is described in greaterdetail in U.S. Pat. No. 6,452,661 and the explanation thereof isomitted.

An essentially extended light source having the prescribed shape isformed in the vicinity of the reflective surface of the second fly-eyemirror 35 b, that is, in the vicinity of the outgoing surface of theoptical integrator 35. The light from the essentially extended lightsource is deflected by a plane reflective mirror 36 and then forms anillumination region in the form of a narrow long circular arc on areticle R (an aperture plate for forming the illumination region in theform of a circular arc is not shown in the figure). Light from thepattern of the illuminated reticle R forms an image of the reticlepattern on a wafer W via a projection optical system PL comprising aplurality of reflective mirrors (six reflective mirrors M1 to M6 areshown as an example in FIG. 12). The reticle R is held on a reticlestage, the wafer W is held on a wafer stage, and the entire patternimage of the reticle R surface is transferred on the wafer W by moving(scanning) the reticle stage and wafer stage.

SUMMARY OF THE INVENTION

Because the EUV radiation is also absorbed by air, a high vacuum must bemaintained in the barrel, and a special configuration is required for areticle carrying system.

Furthermore, reflection-type reticles are also employed in such EUVexposure devices. A transparent thin film called a pericle is used forprotecting the pattern surface in reticles in the conventional exposuredevices using the visible or ultraviolet radiation. However, becausetransparent materials are not used in the EUV exposure devices, asdescribed hereinabove, a pericle cannot be formed and the patternsurface is exposed. Therefore, when the reticle is carried or stored,the pattern surface has to be protected with separate means to preventforeign matter from adhering thereto.

Furthermore, when the reticle is carried, if the reticle is carrieddirectly with a carrying device, there is a risk of the pattern surfacebeing damaged by contact between the reticle and the carrying device ordust being generated by rubbing against the portions other than thepattern surface. Therefore, it is preferred that a method be employed inwhich the protective member is carried in a state in which the reticleis protected by the protective member.

However, if a mutual arrangement of the reticle and protective memberchanges in a method of carrying the protective member that protects theentire reticle or patterned surface, when the protective member iscarried to the reticle stage and the reticle is then mounted on thereticle stage, it is sometimes impossible to mount the reticle in anappropriate position.

With the foregoing in mind, it is an object of the present invention toprovide a reticle carrying device capable of mounting the reticle in anappropriate position when the reticle is carried and mounted on areticle stage of an exposure device even if a reticle protection memberis provided for protecting the entire reticle or a patterned surfacethereof, a reticle protective member suitable for this purpose, anexposure device having such a reticle carrying device, and a method forcarrying the reticle that can achieve this object.

According to one aspect, an embodiment relates to a reticle protectionmember for protecting at least part of a reticle to be used in anexposure device, this reticle protection member comprising an alignmentmark for detecting its position.

Because the reticle protection member is provided with a mark fordetecting its position, it can be used as a reticle protection memberemployed in the device described below.

According to a second aspect, an embodiment has the reticle protectionmember, wherein the reticle, which is the protection object, is areflective-type reticle in which a pattern is formed on one surface, thereticle protection member comprises a first member for protecting thesurface of the reticle where the pattern was formed and a second memberfor protecting the surface opposite that where the pattern was formed,and the first and second members are provided with respective alignmentmarks.

In this case, the reticle can be accommodated and protected between thefirst member and second member. Because each member is provided with arespective mark, their respective positions can be detectedindependently.

According to a third aspect, an embodiment relates to the reticleprotection member, wherein the reticle, which is the protection object,is a reflective-type reticle in which a pattern is formed on onesurface, and the reticle protection member protects at least the regionwhere the pattern was formed of the surface of the reticle where thepattern was formed.

In the reflective-type reticles, the surface where a pattern has notbeen provided and a region where a pattern has not been provided are notalways required to be protected. Therefore, with the present device, thenumber of members is reduced and the structure is simplified.Furthermore, when regions exist in which dust adhesion can be a problem,such as alignment marks or ID marks, even outside the pattern formationregion, it is preferred that those regions also be protected.

According to a fourth aspect, an embodiment relates to a reticlecarrying device for carrying a reticle, comprising reticle carryingmeans for carrying a reticle covered with a reticle protection memberfor protecting at least part of the reticle, first position measurementmeans for measuring the position of the reticle, and second positionmeasurement means for measuring the position of the reticle protectionmember.

With such a configuration, because the position of the reticle ismeasured with the first position measurement means and the position ofthe reticle protection member is measured with the second positionmeasurement means, the mutual arrangement of the reticle and protectionmember can be determined.

When the reticle is transported together with at least part of theprotection member, because the carrying means holds and carries theprotection member, for example, the alignment of the reticle withrespect to the carrying destination site such as a reticle stage of anexposure device is conducted with the carrying device holding theprotection member.

Because the mutual arrangement of the reticle and protective member canbe determined, a position to which the protection member may be carriedin order to position the reticle accurately in the carrying destinationsite is clarified and, therefore, the reticle can be accuratelypositioned in the carrying destination site.

According to a fifth aspect, an embodiment relates to the reticlecarrying device, wherein the reticle, which is the protection object, isa reflective-type reticle in which a pattern is formed on one surface,the reticle protection member comprises a first member for protectingthe surface of the reticle where the pattern was formed and a secondmember for protecting the surface opposite that where the pattern wasformed, and the second position measurement device independentlymeasures the positions of the first member and second member.

With such a configuration, not only the surface where the pattern wasformed, but also the surface where the pattern was not formed can beprotected with the protection member, and the protection becomescomplete.

According to a sixth aspect, an embodiment relates to the reticlecarrying device, wherein the reticle, which is the protection object, isa reflective-type reticle in which a pattern is formed on one surface,and the reticle protection member protects at least the region where thepattern was formed of the surface of the reticle where the pattern wasformed.

With such configuration, at least the region where the pattern wasformed of the surface where the pattern was formed is protected by theprotection member. Therefore, the configuration of the protection memberis simplified.

According to a seventh aspect, an embodiment relates to the reticlecarrying device comprising position correction means for correcting thepositions of the reticle protection member and reticle based on theposition of the reticle and position of the reticle protection membermeasured with the first position measurement means and second positionmeasurement means.

With such a configuration, because the reticle carrying device comprisesthe position correction means for correcting the positions of thereticle protection member and reticle based on the position of thereticle and position of the reticle protection member measured with thefirst position measurement means and second position measurement means,the position of the reticle and the position of the reticle protectionmember are corrected before the reticle (including when the reticle iscarried together with the reticle protection member) is carried to thereticle stage, and when the reticle has been carried to the reticlestage in the sequence of determined carrying means, the reticle can bepositioned in the appropriate position on the reticle stage.Furthermore, the position correction means may have a function ofcorrecting the position of at least one of the reticle protection memberand reticle.

When the carrying means itself has the position correction function, itis not necessary to provide a special position correction means. In thiscase, the two means are combined and the carrying means also serves asthe position correction means.

According to an eighth aspect, an embodiment relates to the reticlecarrying device, comprising position correction means for correcting thepositions of the first member and the reticle based on the position ofthe reticle and position of the reticle protection member measured withthe first position measurement means and second position measurementmeans.

According to a ninth aspect, an embodiment relates to the reticlecarrying device, wherein the reticle carrying means serves to carry thereticle protected by the reticle protection member to the reticle stageand to carry the reticle protection member from the reticle stage toanother location after the reticle has been loaded on the reticle stage,and has a function of conducting the position correction of the reticleand the reticle protection member or the first member with the positioncorrection means before the reticle is loaded on the reticle stage.

Using such a configuration, the reticle protection member has a functionof conducting the position correction of the reticle and the reticleprotection member or the first member with the position correction meansbefore the reticle is loaded on the reticle stage. Therefore, when thereticle has been carried to the reticle stage in the sequence ofdetermined carrying means, the reticle can be positioned in theappropriate position on the reticle stage. Furthermore, the reticleposition correction is not limited to where it is conducted in thealignment stage and also includes the case where it is conducted bychanging the carrying target position of the carrying means.

According to a tenth aspect, an embodiment relates to the reticlecarrying device, wherein the reticle carrying means has a function ofcarrying the reticle protection member to the reticle stage, protectingthe reticle with the reticle protection member, and then carrying thereticle protection member and reticle to recover the reticle from thereticle stage, and a function of measuring the position of the reticleprotection member with the second measurement means before the reticleprotection member is carried to the reticle stage.

With such a configuration, the position of the reticle protection memberis measured in advance, then the reticle protection member is carried tothe reticle stage, and the reticle is protected with the reticleprotection member. In this case, because the position of the reticleprotection member is measured in advance, the reticle and reticleprotection member can be accurately positioned, and damage caused byabnormal contact or generation of dust can be prevented.

According to an eleventh aspect, an embodiment relates to the reticlecarrying device having a function of measuring the positions of thefirst member and second member and then aligning the first member andthe second member and combining them based on the measurement results.

Measuring the positions of the first member and second member and thenaligning the first member and the second member and combining them basedon the measurement results can prevent damage caused by abnormal contactor generation of dust. The first member and second member are sometimescombined not only when the reticle has been protected, but also when ithas not been protected. This is done to prevent dust from enteringbetween the first member and second member when they are, for example,the lower lid and upper lid.

According to a twelfth aspect, an embodiment relates to an exposuredevice comprising the reticle-carrying device described above.

In the exposure device, when the reticle has been carried to the reticlestage, it can be accurately positioned in it and the reticle can be heldin this state in the reticle stage. As a result, the mark detectionrange of the reticle alignment device loaded on the reticle stage can berelatively narrowed and the mark detection time can be shortened.

According to a thirteenth aspect, an embodiment relates to a method forcarrying a reticle to be used in an exposure device, by which a reticlecovered with a reticle protection member for covering at least part isremoved from the protection member and carried to a reticle stage of theexposure device, the method comprising a step of measuring the positionof the reticle and the position of the reticle protection member beforethe reticle is removed, in the course of carrying, from the reticleprotection member.

With such a configuration, when the reticle has been carried to thereticle stage, it can be accurately positioned therein and the reticlecan be held in this state in the reticle stage. The reticle can beremoved either before or after the reticle is loaded on the reticlestage. The above-described operations can be performed as modificationsor applications, or those operations can be added.

Accordingly, there can be provided a reticle carrying device capable ofplacing the reticle in an appropriate position when the reticle iscarried and placed on a reticle stage of an exposure device even when areticle protection member is provided for protecting the entire reticleor a patterned surface, a reticle protective member suitable for use forthis purpose, an exposure device having such a reticle carrying device,and a method for carrying the reticle that can attain this object.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a general view illustrating the relationship between thereticle, clean filter pod (CFP), and reticle carrier (RSP).

FIG. 2 is an assembly diagram of the reticle, clean filter pod (CFP),and reticle carrier (RSP).

FIG. 3 is an exploded perspective view of the configuration shown inFIG. 2.

FIG. 4 is a schematic drawing illustrating the general view of thereticle carrying device that is an example of the preferred embodimentof the present invention and an exposure device.

FIG. 5 illustrates how the reticle carrier is removed from the airreticle stocker.

FIG. 6 illustrates how the clean filter pod is removed from the reticlecarrier in the reticle carrier opener.

FIG. 7 is a general view of the load lock chamber.

FIG. 8 is a general view of the structure of the vacuum reticle library.

FIG. 9 is a general view illustrating the structure of the CFP openerand a state in which the clean filter pod is separated into the upperlid and lower lid and the reticle is removed after being placed and heldon the lower lid.

FIG. 10 is a general view illustrating the state in which the reticleand lower lid are carried inside the exposure device.

FIG. 11 is a general view of the position measurement device provided inthe CFP opener.

FIG. 12 is a general view of the EUV exposure device.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT

An example of a preferred embodiment of the present invention will beexplained below with reference to the appended drawings, but the presentinvention is not limited to this example. First, the relationshipbetween a reticle and a reticle protection member, on which theembodiment of the present invention is premised, will be explained. FIG.1 is a schematic drawing illustrating the relationship between areticle, a clean filter pod (CFP), which is a reticle protection member,and a reticle carrier (also called RSP: reticle SMIF pod).

A reticle 1 is accommodated in a clean filter pod 2 having an upper lid2 a and a lower lid 2 b, so that it is sandwiched between the upper lid2 a and lower lid 2 b and protected thereby. Furthermore, the cleanfilter pod 2 is accommodated inside a reticle carrier 3 having a base 3a and a cover 3 b. The reticle carrier 3 is sometimes also called areticle SMIF pod (RSP). A plurality of clean filter pods 2 are sometimesaccommodated inside the reticle carrier 3, but in the followingexplanation of the embodiment, an example will be considered in whichone clean filter pod is accommodated.

FIG. 2 is an assembly drawing illustrating the state in which thereticle 1 is thus accommodated inside the clean filter pod 2 and theclean filter pod 2 is accommodated in the reticle carrier 3. FIG. 3 isan exploded perspective view thereof. In the figures described below,the structural elements identical to the structural elements shown inthe aforementioned figures will be assigned with identical symbols andthe explanation thereof will be omitted.

The cover 3 b is from a transparent resin. Protruding sections 3 c thatwill be grabbed and raised by an air robot 12 when the reticle carrier 3is carried are provided in two places.

The upper lid 2 a is usually formed from a metal such as aluminum, has afilter 2 c and also has a transparent window 2 d formed from glass orthe like. The filter 2 c serves to ensure sufficient conductance, whilepreventing the penetration of fine particles such as dust. Furthermore,even when the upper lid 2 a and lower lid 2 b of the clean filter pod 2are engaged and an internal space is formed, the filter reduces thedifference in air pressure between the outside and the internal spaceand prevents a force caused by the difference in pressure from beingapplied to the upper lid 2 a and lower lid 2 b. As described below,because the clean filter pod 2 is carried through atmosphere and spaceunder high vacuum, the internal pressure regulating mechanism employingsuch a filter is necessary. The transparent window 2 d makes it possibleto observe the state of the reticle 1 from the outside.

Protruding sections 2 e are provided in two places, on the left andright side as shown in the figure, on the upper lid 2 a. As describedhereinabove, they are used for separating the upper lid 2 a and lowerlid 2 b by grabbing and holding those sections with holding members andlowering the lower lid 2 b down. Furthermore, a position detection mark2 f for detecting the position of the upper lid 2 a is provided thereonand, as explained herein below, the position of the upper lid 2 a isdetected by measuring the position of the mark with a positionmeasurement apparatus.

The lower lid 2 b is usually formed from a metal such as aluminum andhas two pairs of alignment pins 2 g provided in four corners thereof.When the reticle 1 is held, the alignment of the reticle 1 in the planedirection is conducted with the alignment pins 2 g. Furthermore,projections 2 h for holding the reticle are provided in three places,and the reticle 1 is supported in three points by the projections 2 hfor supporting the reticle.

Furthermore, two transmitting windows 2 i, 2 j made from glass or thelike are provided in the lower lid 2 b in order to enable theobservation of an ID mark or a mark formed on the reticle 1 from belowthe lower lid 2 b in the reticle position measurement device which isthe main component according to the present invention. In the figure,they are provided in two locations, but if the position of the alignmentmark formed on the reticle 1 is fixed, they may be provided in onelocation.

Three pins 3 e to be loosely fitted into the holes provided in the lowerlid 2 b (in FIG. 3, the holes are provided on the rear side and are notseen in the figure) are provided in the base 3 a, thereby ensuringcoarse alignment of the lower lid 2 b and base 3 a. Projections 3 d forfour-point supporting the lower lid 2 b are also provided in the base 3a.

A mark for position measurement is provided in the lower lid 2 b in thesame manner as in the upper lid 2 a; in the configuration shown in FIG.3, the mark is provided on the rear side and is not seen in the figure.A mark for position measurement is also provided in the reticle 1; it isalso provided on the rear side and is not seen in the figure. The lowersurface of the reticle 1 is a patterned surface. As a result, theadhesion of dust or the like under gravity to the surface where thepattern was formed is effectively prevented.

The reticle 1 is carried to the reticle carrying device after beingdouble accommodated in the clean filter pod 2 and reticle carrier 3, asshown in FIG. 2. The reticle-carrying device of the embodiment of thepresent invention will be overviewed below.

FIG. 4 is a schematic drawing illustrating the general view of thereticle carrying device that is an example of the embodiment of thepresent invention and an exposure device. The reticle 1 that was carriedfrom the outside is accommodated in an air reticle stocker 11.Alternatively, it is carried in after being accommodated in the airreticle stocker 11. Then, it is carried with an air robot 12 to thereticle carrier opener 13, and the clean filter pod 2 is removed inclean atmosphere inside the reticle carrier opener 13 from inside thereticle carrier. Then, the clean filter pod 2 is removed with an airrobot 14 and carried into a load lock chamber 15. A path between theload lock chamber 15 comprising the air robot 14 and the reticle carrieropener 13 is under clean atmosphere.

The inside of the load lock chamber 1S is then evacuated and a vacuumstate is attained inside the load lock chambers 15 and the clean filterpod 2. Once the evacuation has been completed, the clean filter pod 2 isremoved from the side of the load lock chamber 15 with a vacuum robot16. Thus, two doors 15 a, 15 b are provided in the load clock chamber15. When the load lock chamber 15 is in an air open state, the door 15 bis closed, the door 15 a is open, and the clean filter pod 2 is carriedin from inside the reticle carrier opener 13. Then, the door 15 a isclosed, evacuation is conducted, and once the evacuation has beencompleted, the door 15 b is opened, and the clean filter pod 2 isremoved with the vacuum robot 16 into the vacuum region.

The clean filter pod 2 that was carried into the vacuum region iscarried into a vacuum reticle library 17 and temporarily stored therein.Actually, when the reticle 1 is used in an exposure device 19, the cleanfilter pod 2 accommodating the reticle is removed by the vacuum robot 16from the vacuum reticle library 17, carried into a CFP opener 18, andthe upper lid 2 a of the clean filter pod 2 is removed by the CFP opener18 from the reticle 1 and the lower lid 2 b. The CFP opener 18, asdescribed herein below, comprises a pre-alignment mechanism for thereticle 1 and the lower lid 2 b.

Then, the reticle 1 that was placed on the lower lid 2 b is carried to areticle stage 19 a of the exposure device 19 by the vacuum robot 16.Then, chucking is conducted with an electrostatic chuck of the reticlestage 19 a, and the reticle is separated from the lower lid 2 b and usedfor exposure. The separated lower lid 2 b is returned by the vacuumrobot 16 into the CFP opener 18 and held by the vacuum robot 16 in astand-by mode till the use of the reticle 1 is completed.

Once the use of reticle 1 has been completed, the vacuum robot 16carries the lower lid 2 b to the reticle stage 19 a. If the chucking ofthe electrostatic chuck is released after the lower lid was stopped inthe prescribed location, the reticle 1 is placed on the lower lid 2 b.In this state, the vacuum robot 16 carries the lower lid 2 b into theCFP opener 18, and the lower lid 2 b is covered inside the CFP opener 18with the upper lid 2 a that was heretofore separated. The vacuum robot16 then returns the clean filter pod 2 into the vacuum reticle library17 for storage.

When the clean filter pod 2 is removed from the vacuum region, the cleanfilter pod 2 located in the vacuum reticle library 17 is introduced bythe vacuum robot 16 into the load lock chamber 15. Here, after thepressure inside the load lock chamber 15 became the atmosphericpressure, the clean filter pod is returned by the air robot into thereticle carrier opener 13, accommodated in the reticle carrier 3, andstored in the air reticle stocker 11. The desired reticle carrier 3 thathas been stored in the air reticle stocker 11 is carried to the outsideby an operator or a robot.

In FIG. 4, the reference numeral 20 a stands for a reticle carrier IDreader for reading the identification code of the reticle carrier 3 andthe reference numeral 20 b stands for a reticle ID reader for readingthe identification code of the reticle 1 and the clean filter pod 2. Theinformation of the reticle carrier 3, reticle 1, and clean filter pod 2is read by those readers, the target reticle 1 is supplied to theexposure device, and the reticle 1 removed from the exposure device isaccommodated in the prescribed clean filter pod 2 and reticle carrier 3.The reference numeral 21 stands for a temperature compensation lamp forconducting temperature adjustment of the reticle in order to compensatethe decrease in temperature occurring when the reticle 1 is vacuumgrabbed.

FIG. 5 illustrates how the reticle carrier 3 is removed from the airreticle stocker 11. The air reticle stocker is a rack comprisingvertical plates 11 a and horizontal plates 11 b (another vertical plate11 a is not shown in the figure), and reticle carriers 3 accommodatingthe reticle 1 and the clean filter pod 2 are placed on each horizontalplate 11 b. The reticle carrier 3 having the selected reticleaccommodated therein is held by a robot arm 12 a of the air robot 12 andcarried to the reticle carrier opener 13. The reticle carrier opener 13has a structure identical to that of the well-known reticle SMIF pod(RSP) and detailed description thereof is herein omitted. FIG. 6illustrates a state in which the cover 3 b of the reticle carrier 3 isseparated from the base 3 a by the reticle carrier opener 13. Thereticle carrier 3 disposed on the upper plate of the reticle carrier 13by the robot arm 12 is fixed to the housing (not shown in the figure) ofthe reticle carrier opener 13, and part of the upper plate of thereticle carrier opener 13 and the base 3 a are moved together downward,thereby disposing the clean filter pod 2 in the clean atmosphere insidethe reticle carrier opener. A robot arm 14 a of the air robot 14 entersthe reticle carrier opener 13, the clean filter pod 2 that becameuncovered in the clean atmosphere after being placed on the base, isseized by the robot arm 14 a, removed and accommodated inside the loadlock chamber 15. Then, the cover 3 b and the base 3 a are combinedtogether by again raising the base 3, and the empty reticle carrier isreturned to the air reticle stocker 11. Then, the next necessary reticleis selected and carried to the load lock chamber 15 in the same manneras described above.

FIG. 7 is a general view of the load lock chamber 15. The figure shows astate in which the door 15 a is open and the door 15 b is closed. Inthis state, the clean filter pod 2 that was carried by the robot arm 14a is placed on a stand 15 c. From this state, the door 15 is closed,evacuation is conducted, then the door 15 b is opened, and the cleanfilter pod 2 is removed by the vacuum robot 16. Furthermore, thepositions of door 15 a and door 15 b in FIG. 4 and FIG. 7 are different,but this is done merely for the sake of convenience. Any mutualarrangement of those doors may be employed. If the clean filter pod 2 isopened during evacuation, dust can adhere to the reticle. Therefore, itis preferred that the pod 2 be fixed with mechanical means or the like,so as not to be opened when the load lock chamber is evacuated or air isreleased therefrom.

FIG. 8 is a general view of the structure of the vacuum reticle library17. The vacuum reticle library 17 is a rack comprising vertical plates17 a and horizontal plates 17 b (another vertical plate 17 a is notshown in the figure), and clean filter pods 2 accommodating the reticles1 are placed on each horizontal plate 17 b. Each horizontal plate 17 bhas a L-like shape so that the end portions of the clean filter pods 2are in a floating state and that the distal end portions of the vacuumrobot arm 16 can be inserted below the lower lid 2 b and scoop up thelower lid 2 b.

FIG. 9 is a general view illustrating the structure of a CFP opener 18and showing a state in which the clean filter pod 2 is separated fromthe upper lid 2 a and lower lid 2 b and the reticle 1 is removed in astate in which it is placed on the lower lid 2 b.

The CFP opener 18 is a one-stage rack composed of vertical plates 18 aand horizontal plates 18 b (another vertical plate 18 a is not shown inthe figure), the protruding sections 2 e of the upper lid 2 a hang onthe horizontal plate 18 b and the upper lid 2 a is suspended thereon.

If the clean filter pod 2 is lowered from above the horizontal plate 18b in a state in which the lower surface of the lower lid 2 b issupported by distal end sections of the vacuum robot aim 16 a, theprotruding sections 2 e of the upper lid 2 a are caught by thehorizontal plate 18, and if the position of the vacuum robot arm 16 a isfurther lowered, the lower lid 2 b and the reticle 1 located thereonfall down, but because the protruding sections 2 e of the upper lid 2 ahang on the horizontal plate 18 b, the upper lid remains held on thehorizontal plate 18 b, as shown in the figure, and the upper lid 2 a,lower lid 2 b, and reticle 1 are separated. The reticle 1 that wasplaced and held on the lower lid 2 b can be removed in this state bypulling the vacuum robot aim 16 a in the direction shown by an arrow.

An alignment stage 22 is provided on the CFP opener 18. As shown in thefigure, the alignment stage 22 can move in the X direction and Ydirection perpendicular thereto and also can rotate (θ) in the Zdirection perpendicular to those two directions. In the present example,the horizontal plate 18 b carrying the upper lid 2 a is fixed, but whenthe position of the upper lid is desired to be adjusted, it can be movedby providing drive means.

When the alignment (position adjustment) of the reticle 1 is wished tobe conducted, if the vacuum robot arm 16 a is lowered in a state wherethe lower lid 2 b carrying the reticle 1 is sandwiched between thedistal end sections of the vacuum robot arm 16 a, the lower lid 2 b canbe placed on the alignment stage 22. The central portion of thealignment stage 22 protrudes forward so that the vacuum robot arm 16 acan be lowered to a position such that the distal end section of thevacuum robot arm 16 a does not come into contact with the lower lid 2 bin a state where the lower lid 2 b is placed and held on the alignmentstage 22. A through hole 22 a is provided in the central portion of thealignment stage 22, but this is done, as described herein below, so thatthe position of the lower lid 2 b and the position of the reticle 1 canbe detected with the position detection device.

FIG. 10 is a general view illustrating the state where the reticle 1 andthe lower lid 2 b were carried into the exposure device. The referencenumeral 23 stands for a barrel of the exposure device, and the referencenumeral 24 stands for an electrostatic chuck provided on the reticlestage 19 a (not shown in FIG. 10) of the exposure device. If the reticle1 placed and held on the lower lid 2 b is carried to the prescribedposition by the vacuum robot arm 16 a and chucked by the electrostaticchuck 24, only the reticle 1 will be fixed to the reticle stage 19 a,and the lower lid 2 b will remain held by the vacuum robot arm 16 a. Inthis state, the lower lid 2 b is returned into the CFP opener 18 by thevacuum robot arm 16 a. It is preferred that prior to chucking with theelectrostatic chuck 24 the reticle be pressed against the electrostaticchuck 24 by the vacuum robot or other means.

Thus, till the use of the reticle 1 is completed, the lower lid 2 b maybe in a stand-by mode inside the CFP opener 18, but in order to preventdust from entering the lower lid 2 b, the upper lid 2 a and lower lid 2b may be returned in a mated state, and the empty clean filter pod 2 maybe returned to the vacuum reticle library 17 by using the vacuum robot16 and stored therein.

In this case, when the use of reticle 1 is completed, the correspondingclean filter pod 2 may be identified by the reticle ID reader 20 b,removed, and carried to the CFP opener 18, the upper lid 2 a and lowerlid 2 b may be separated by the above-described method and then thelower lid 2 b may be moved to the position of the reticle stage 19 a bythe vacuum robot 16 and the reticle 1 may be received.

With such a configuration, because the vacuum robot 16 becomes free,when the reticle is used for exposure, another reticle can be carried tothe vacuum reticle library 17, or the reticle which is next to be usedcan be aligned.

Furthermore, in the CFP opener 18, the upper lid 2 a and lower lid 2 bmay be mated and held by the vacuum robot arm 16 a in a standby mode. Inthis case, the carrying time can be shortened by comparison with that ofthe process in which the empty clean filter pod 2 is returned to thevacuum reticle library 17, while preventing dust from entering the lowerlid 2 b.

A method for recovering the reticle 1 from the reticle stage 19 to theclean filter pod 2 was described above, but the carrying method in whichthe clean filter pod 2 is accommodated inside the reticle carrier 3 maybe conducted inversely to the above-described process of removing theclean filter pod 2 from the reticle carrier 3 and carrying it to the CFPopener 18, and the explanation of this method is not required for aperson skilled in the art.

In the configuration explained hereinabove, the clean filter pod 2,which accommodated and protected the reticle 1 inside thereof, wascomposed of the upper lid 2 a and lower lid 2 b. However, the protectionof the reticle 1 sometimes may be conducted only on the lower surfacewhere the pattern has been formed and only on the region of the lowersurface that is wished to be protected, for example, a pattern formationregion. In this case, the upper lid 2 a is unnecessary and the shape ofthe lower lid is different. When such a reticle protection member ishandled, the structure for separating the upper lid 2 a inside the CFPopener 18 is unnecessary and simply the alignment stage 22 forconducting the alignment of the reticle 1 and the below-describedposition measurement device may be employed. As a result, theconfiguration of the device is simplified accordingly. In both cases,the alignment stage 22 is sometimes unnecessary when the alignment isconducted with a vacuum robot.

In the explanation provided hereinabove, the vacuum reticle library 17and CFP opener 18 were separate devices, but they can be combined into asingle device. Thus, one of the racks of the vacuum reticle library 17may be configured identically to the rack of the CFP opener 18, and thealignment stage 22 may be provided in the vacuum reticle library 17.

FIG. 11 is a general view of the position measurement devices providedinside the CFP opener 18. In the present embodiment, there are providedposition measurement devices for the reticle 1, upper lid 2 a, and lowerlid 2 b, and the respective marks for position measurement are providedon the reticle 1, upper lid 2 a, and lower lid 2 b correspondingly tothe position measurement devices. A position measurement mark 25 (shownas 2 f in FIG. 3) is provided on the upper lid 2 a, a positionmeasurement mark 26 is provided on the reticle 1, and a positionmeasurement mark 27 is provided on the lower lid 2 b.

Furthermore, a position measurement device 28 is provided for detectingthe position of the position measurement mark 25, a position measurementdevice 29 is provided for detecting the position of the positionmeasurement mark 26, and a position measurement device 30 is providedfor detecting the position of the position measurement mark 27. Examplesof the shape of the position measurement marks 25, 26, 27 generallyinclude a cross mark formed by the intersecting line parallel to the Xdirection shown in FIG. 11 and line parallel to the Y direction and atwo-dimensional line-and-space pattern in which line-and-space patternsare arranged in both the X direction and the Y direction. In the presentembodiment, such marks are provided in two locations in the Y directionshown in FIG. 11 (for example, see 2 f in FIG. 3) on the upper lid 2 a,reticle 1, and lower lid 2 b. Therefore, each of position measurementdevices 28 to 30 comprises two detectors.

The position measurement device 28 measures the position of the upperlid 2 a by measuring the position of the position measurement mark 25when the upper lid 2 a assumes a state in which it is suspended on thehorizontal plate 18 b. The position measurement device 29 measures theposition of the position measurement mark 26 formed on the lower surfaceof the reticle 1 via the through hole 22 a and transmission window 2 jwhen the lower lid 2 b assumes a state in which it is placed and held onthe alignment stage 22, thereby measuring the position of the reticle 1.The position measurement device 30 measures the position of the positionmeasurement mark 27 formed on the lower surface of the lower lid 2 b viathe through hole 22 a and transmission window 2 j when the lower lid 2 bassumes a state in which it is placed and held on the alignment stage22, thereby measuring the position of the lower lid 2 b.

The structure of the position measurement devices 28, 29, 30 is suchthat the images of the position measurement marks 25, 26, 27, which havea cross-like shape, are picked up with two-dimensional imaging devicesvia optical microscopes, thereby detecting the positions of the positionmeasurement marks 25, 26, 27 in the X direction and Y direction.Well-known microscopes that have been used in the conventional exposuredevices can be used in such a structure and the explanation thereof isomitted. Furthermore, because the position measurement marks 25, 26, 27are formed by two, the rotation of the upper lid 2 a, reticle 1, andlower lid 2 b about the Z axis can be detected.

The alignment procedure implemented after the upper lid 2 a and lowerlid 2 b have been separated by the CFP opener 18 till the reticle isplaced and held on the reticle stage will be described below. Theposition measurement mark 27 on the lower lid 2 b separated by theopener 18 is measured with the position measurement device 30. Theposition measurement device 30 may be a microscope with a relatively lowmagnification, and a relatively wide mark detection region is preferred.The alignment stage 22 is moved in the X and Y directions and rotatedabout the z-axis so that the mark 27 measured with the positionmeasurement device 30 be arranged in the prescribed position. Then, theposition measurement mark 26 formed on the reticle 1 is measured withthe position measurement device 29. This position measurement device ispreferably a microscope with a relatively high magnification. Inmicroscopes with high magnification, the mark detection region tends tobecome relatively narrow, but the mark 26 can be introduced into suchrelatively narrow detection region by alignment of the mark 27. Thealignment stage is moved in the X and Y directions and rotated about thez-axis so that the mark 26 be arranged in the prescribed position basedon the measurement results obtained for the mark 26. The reticle 1 andlower lid 2 b that were thus positioned are again held by the vacuumrobot arm and then carried to the reticle stage and the reticle 1 isfixed to the reticle stage. The reticle 1 is positioned on the reticlestage by using another alignment system, but because the reticle hasbeen aligned, as described hereinabove, before being placed on thereticle stage, the alignment system carried on the reticle stage canhave a relatively narrow mark detection region, and the measurementaccuracy is easily increased. Furthermore, the alignment can be alsoconducted by using a vacuum robot arm, without moving the alignmentstage 26. In this case, the position of the vacuum robot arm may beadjusted after measuring the position of the alignment mark 27, and thenthe position of the alignment mark 26 may be measured and the reticlestage may be carried by taking the position measurement results intoaccount. Moreover, sometimes the alignment stage 22 and vacuum robot arm16 are used together. For example, the alignment in the X and Ydirection can be conducted with the vacuum robot arm 16, and therotation about the Z-axis can be adjusted with the alignment stage 22.In this case, the alignment of the lower lid 2 b is implemented byconducting position measurements on the alignment stage 22, then raisingthe lower lid 2 b with the vacuum robot arm, adjusting the positions inthe X and Y directions, and then placing on the alignment stage 22. Theadjustment of rotation about the Z-axis is carried out with thealignment stage 22 before or after the adjustment with the vacuum robotarm. Then, the alignment mark 26 is measured, the rotation about the Zaxis is adjusted with the alignment stage 22, and then the position inthe X and Y directions is adjusted with the vacuum robot arm in thecourse of carrying to the reticle stage, and the reticle is placed onthe reticle stage.

The position of the reticle 1 and the position of the lower lid 2 b aremeasured with the above-described object. Furthermore, if the detectionregion of the position measurement device 29 for measuring the alignmentmark 26 provided on the reticle 1 is sufficiently wide and themeasurements are always possible, then measurements of the alignmentmark 27 provided on the lower lid 2 b become unnecessary.

Furthermore, it is preferred that the position of the lower lid 2 b bemeasured after the use of reticle 1 has been completed and before thelower lid 2 b is carried to the reticle stage 19 a for recovering thereticle 1 from the reticle stage 19 a. When the chucking with anelectrostatic chuck 24 of the reticle stage 19 a is released and thereticle 1 is placed and held on the lower lid 2 b, if the mutualarrangement of the reticle 1 and lower lid 2 b does not correspond tothe appropriate positions, abnormal contact occurs between the reticle 1and the lower lid 2 b (for example, the reticle 1 is not insertedproperly between the alignment pins 2 g shown in FIG. 3 and assumes afloating state or rubs against them), causing damage of the reticle 1 ordust generation.

In order to prevent it, the mutual relative arrangement of the reticle 1and lower lid 2 b in the case where the lower lid 2 b is carried to thereticle stage 19 a with the vacuum robot arm 16 a and the vacuum robotarm 16 a is stopped in the prescribed position is determined bymeasuring the position of the position measurement mark 17 anddetermining the position of the lower lid 2 b, and the stop position ofthe vacuum robot arm 16 a is corrected according to the displacement.Alternatively, the mutual relative arrangement of the reticle 1 andlower lid 2 b in the case where the vacuum robot arm 16 a is stopped inthe prescribed position is determined, the position of the lower lid 2 bis corrected accordingly with the alignment stage 22, and then the lowerlid is carried by the vacuum robot 16 to the prescribed position of thereticle stage 19 a.

Measuring the position of the upper lid 2 a by measuring the position ofthe position measurement mark 25 is conducted so that the upper lid 2 aand lower lid 2 b be accurately mated when the use of reticle 1 iscompleted and the reticle 1 is placed on the lower lid 2 b andrecovered, or when the upper lid and lower lid are closed and air isintroduced in order to prevent dust from entering the above-describedpod. Thus, the lower lid 2 b is lifted with the vacuum robot arm 16 ainside the CFP opener 18 and fit into the upper lid 2 a that wassuspended on the horizontal plate 18 b, but if a displacement occursbetween the upper lid 2 a and lower lid 2 b at this time, the lower lid2 b is not properly mated with the upper lid 2 a, and there is a risk ofthe lids damaging each other or of the abnormal contact generating dust.

Accordingly before the lower lid 2 b is fit into the upper lid 2 a, therelative positions of the upper lid 2 a and lower lid 2 b are measured,the position of the vacuum robot arm 16 a is adjusted so that the twolids fit each other properly, and the lower lid is then raised.Alternatively, when the alignment stage 22 is provided, the position ofthe lower lid 2 b is adjusted with the alignment stage 22 and the lowerlid is then raised with the vacuum robot arm 16 a.

Furthermore, in this case, when the reticle 1 is accommodated in thelower lid 2 b in an inappropriate position with respect to the lower lid2 b, if the upper lid and lower lid are closed in this state, thereticle can be damaged. Therefore, it is preferred that not only thepositions of the upper lid 2 a and lower lid 2 b, but also the positionof the reticle 1 be measured and that measurements be conducted todetermine whether or not the reticle 1 has been arranged in theappropriate position with respect to the lower lid 2 b. When the reticleposition is inappropriate, it is possible to return again to the reticlestage, chuck the reticle, adjust the position of the lower lid, and thenplace the lower lid anew, or to provide a separate mechanism forchanging only the reticle position, or to carry the lower lid directlyto the outside of the device through the load lock chamber, withoutplacing the upper lid. In the case of carrying to the outside of thedevice, without placing the upper lid, the upper lid is also carried tothe outside of the device via a separate route. It goes without sayingthat in the configuration in which the upper lid 2 a is not used as theprotective member, only the lower lid 2 b is provided, and only thepatterned surface of the reticle 1 is protected, the alignment of theupper lid 2 a and lower lid 2 b is unnecessary.

In the explanation hereinabove, the alignment was conducted only withrespect to the X and Y directions and rotation about the Z-axis, but thealignment may be also conducted with respect to the Z-axis direction androtation about the X and Y-axes.

In the explanation provided hereinabove, the EUV exposure device wasconsidered as an example, but the present invention, if necessary, canbe also employed in carrying devices of exposure devices other than theEUV exposure devices, inspection devices, and mask cleaning devices.

1. A reticle conveyance device that conveys a reticle, comprising: areticle carrying mechanism configured to carry a reticle at least partlyprotected by a reticle protective member, a first position measurementdevice arranged to measure the position of the reticle, a secondposition measurement device arranged to measure the position of thereticle protective member, and a position mover configured to move thereticle protection member and the reticle based on the position of thereticle and the position of the reticle protection member as measured bythe first position measurement device and the second positionmeasurement device.
 2. An exposure device comprising the reticleconveyance device of claim
 1. 3. A reticle conveyance device forcarrying a reticle, comprising: a reticle carrying mechanism configuredto carry a reticle at least partly protected by a reticle protectionmember comprising a first member and a second member, a first positionmeasurement device arranged to measure the position of the reticle asecond position measurement device arranged to measure the position ofthe reticle protection member, and a position mover configured to movethe first member and the reticle based on the position of the reticleand the position of the reticle protection member as measured by thefirst position measurement device and the second position measurementdevice, wherein the reticle is a reflective-type reticle having apattern on one surface, wherein the reticle protective member comprisesthe first member for protecting that the surface of the reticle having apattern, and the second member for protecting a surface opposite to thesurface having a pattern, and wherein the second position measurementdevice independently measures the positions of the first member and thesecond member.
 4. A reticle carrying device for carrying a reticle,comprising: a reticle carrying mechanism configured to carry a reticleat least partly protected by a reticle protection member, a firstposition measurement device arranged to measure the position of thereticle, a second position measurement device arranged to measure theposition of the reticle protection member, and a position moverconfigured to move the reticle protection member and the reticle basedon the position of the reticle and the position of the reticleprotection member as measured by the first position measurement deviceand the second position measurement device, wherein the reticle carryingmechanism is further configured to carry the reticle protected by thereticle protection member to a reticle stage and to carry the reticleprotection member from the reticle stage to another location after thereticle has been loaded on the reticle stage, and the position mover isconfigured to move the reticle and the reticle protection member beforethe reticle is loaded on the reticle stage.
 5. A reticle conveyancedevice for carrying a reticle, comprising: a reticle carrying mechanismconfigured to carry a reticle at least partly protected by a reticleprotection member, a first position measurement device arranged tomeasure the position of the reticle, a second position measurementdevice arranged to measure the position of the reticle protectionmember, and a position mover configured to move a first member of thereticle protection member and the reticle based on the position of thereticle and the position of the reticle protection member as measured bythe first position measurement device and the second positionmeasurement device, wherein the reticle is a reflective-type reticlehaving a pattern on one surface, wherein the reticle protection membercomprises a first member for protecting the surface of the reticlehaving the pattern and a second member for protecting a surface oppositeto the surface having the pattern, wherein the second positionmeasurement device independently measures the positions of the firstmember and the second member, wherein the reticle carrying mechanism isconfigured to carry the reticle protected by the first member to areticle stage and to carry the first member from the reticle stage toanother location after the reticle has been loaded on the reticle stage,and the position mover is configured to move the reticle and the firstmember before the reticle is loaded on the reticle stage.
 6. A reticlecarrying device for carrying a reticle, comprising: a reticle carryingmechanism configured to carry a reticle at least partly protected by areticle protection member comprising a first member and a second member,a first position measurement device arranged to measure the position ofthe reticle, a second position measurement device arranged to measurethe position of the reticle protection member, and a position moverconfigured to align and combine the first member and the second memberbased on the measured positions of the first member and the secondmember, wherein the reticle is a reflective-type reticle having apattern on one surface, wherein the reticle protection member comprisesthe first member for protecting the surface of the reticle having thepattern and the second member for protecting a surface opposite to thesurface having the pattern, and wherein the second position measurementdevice independently measures the positions of the first member and thesecond member.
 7. A reticle conveyance device for carrying a reticle,comprising: a reticle carrying mechanism configured to carry a reticleat least partly protected by a reticle protection member comprising afirst member and a second member, a first position measurement devicearranged to measure the position of the reticle a second positionmeasurement device arranged to measure the position of the reticleprotection member, and a reticle protection member opener arranged toseparate the second member from the first member, wherein the reticle isa reflective-type reticle having a pattern on one surface, wherein thereticle protection member comprises the first member for protecting thesurface of the reticle having the pattern and the second member forprotecting a surface opposite to the surface having the pattern, andwherein the second position measurement device independently measuresthe positions of the first member and the second member.
 8. A reticlecarrying device for carrying a reticle, comprising: a first positionmeasurement device arranged to measure the position of the reticle asecond position measurement device arranged to measure the position of areticle protection member, a reticle protection member opener arrangedto separate a second member from a first member, and a position moverconfigured to move the first member and the reticle based on measuredpositions of the first member, the reticle, and the second member whilethe second member is in the reticle protection member opener, whereinthe reticle is a reflective-type reticle having a pattern on onesurface, wherein the reticle protection member comprises the firstmember for protecting the surface of the reticle having the pattern andthe second member for protecting a surface opposite to the surfacehaving the pattern, and wherein the second position measurement deviceindependently measures the positions of the first member and the secondmember.
 9. A carrying device for carrying a reticle, comprising: areticle carrying mechanism configured to carry a reticle at least partlyprotected by a reticle protection member comprising a first member and asecond member, a first position measurement device arranged to measurethe position of the reticle a second position measurement devicearranged to measure the position of the reticle protection member, areticle protection member opener arranged to separate the second memberfrom the first member, and a position mover configured to move the firstmember to contact the second member in the reticle protection memberopener based on measured positions of the first member and the secondmember, wherein the reticle is a reflective-type reticle having apattern on one surface, wherein the reticle protection member comprisesthe first member for protecting the surface of the reticle having thepattern and the second member for protecting a surface opposite to thesurface having the pattern, and wherein the second position measurementdevice independently measures the positions of the first member and thesecond member.
 10. A reticle carrying device for carrying a reticle,comprising: a reticle carrying mechanism configured to carry a reticleat least partly protected by a reticle protection member comprising afirst member and a second member, a first position measurement devicearranged to measure the position of the reticle, a second positionmeasurement device arranged to measure the position of the reticleprotection member, a reticle protection member opener arranged toseparate the second member from the first member, and a position moverconfigured to move the first member and the reticle based on measuredpositions of the first member, the reticle, and the second member whilethe second member is in the reticle protection member opener, whereinthe reticle is a reflective-type reticle having a pattern on onesurface, wherein the reticle protection member comprises the firstmember for protecting the surface of the reticle having the pattern andthe second member for protecting a surface opposite to the surfacehaving the pattern, wherein the second position measurement deviceindependently measures the positions of the first member and the secondmember, and wherein the position mover moves the first member and thereticle based on the measurements of the first position measurementdevice and the second position measurement device.
 11. A reticlecarrying device for carrying a reticle, comprising: a reticle carryingmechanism configured to carry a reticle at least partly protected by areticle protection member comprising a first member and a second member,a first position measurement device arranged to measure the position ofthe reticle a second position measurement device arranged to measure theposition of the reticle protection member, a reticle protection memberopener arranged to separate the second member from the first member, anda position mover configured to move the first member and the reticlebased on measured positions of the first member, the reticle, and thesecond member while the second member is in the reticle protectionmember opener, wherein the reticle is a reflective-type reticle having apattern on one surface, wherein the reticle protection member comprisesthe first member for protecting the surface of the reticle having thepattern and the second member for protecting a surface opposite to thesurface having the pattern, wherein the second position measurementdevice independently measures the positions of the first member and thesecond member, and wherein the position mover brings the first memberinto contact with the second member.
 12. A method for carrying a reticleto be used in an exposure device, comprising protecting at least part ofthe reticle with a protection member, measuring the position of thereticle and the position of the protection member while the protectionmember protects at least part of the reticle, and carrying the reticleand the protection member to a reticle stage.
 13. A reticle protectivedevice that protects a reticle in which a pattern had been formed, thereticle protective device comprising: a first cover member capable ofsealing and holding the reticle, and a second cover member capable ofsealing and holding the first cover member, wherein the first covermember has a light transmission portion for detecting a specific portionof the reticle held within the first cover member that had beenstipulated in advance from outside of the first cover member.
 14. Thereticle protective device of claim 13, wherein the first cover member isconfigured to be conveyed within a storage member in which theenvironment had been conditioned while holding the reticle, and whereinthe second cover member is configured to be conveyed outside of astorage member in which the environment had been conditioned whileholding the first cover member in which the reticle is held.
 15. Thereticle protective device of claim 13, wherein the light transmissionportion is positioned at a location where a mark portion in which thereticle had been positioned can be detected as the specific portion ofthe reticle.
 16. The reticle protective device of claim 13, wherein thefirst cover member has a first member that protects the surface of thereticle on which a pattern has been formed and a second member protectsthe opposite surface from the surface on which a pattern has beenformed, wherein the light transmission portion is positioned in at leastone of the first member and the second member.
 17. The reticleprotective device of claim 16, wherein the first member and the secondmember have alignment marks that detect a position.
 18. The reticleprotective device of claim 13, wherein the first cover member is used toprotect a reflective reticle on one surface of which a pattern has beenformed, and wherein the region of pattern formation on the surface ofthe reticle in which a pattern has been formed is protected.
 19. Thereticle protective device of claim 13, wherein the first cover member isseparated from the reticle under a vacuum.
 20. A method for carrying areticle to be used in an exposure device, comprising protecting at leastpart of the reticle with a protection member, measuring the position ofthe reticle and the position of the protection member while theprotection member protects at least part of the reticle, and carryingthe reticle and the protection member to a reticle stage.
 21. The methodaccording to claim 20, further comprising, after carrying the reticleand the protection member to a reticle stage, chucking the reticle tothe reticle stage, and removing the reticle from the protection member.22. The method according to claim 21, further comprising, after removingthe reticle from the protection member, measuring the position of theprotection member, and returning the reticle to the protection member.23. The method according to claim 22, further comprising adjusting theposition of the protection member before returning the reticle to theprotection member.
 24. The method according to claim 22, furthercomprising, after returning the reticle to the protection member,measuring the position of the reticle and the position of the protectionmember.
 25. The method according to claim 24, further comprisingadjusting the position of at least one of the reticle and the protectionmember after returning the reticle to the protection member.
 26. Themethod according to claim 21, wherein the protection member comprises afirst member and a second member, and the method further comprises,removing the second member from the first member before carrying thereticle to the reticle stage, measuring the position of the first memberbefore returning the reticle to the first member of the protectionmember, measuring the positions of the reticle, the first member, andthe second member, and, based on the measured positions, returning thesecond member to the first member.
 27. The method according to claim 26,further comprising adjusting the position of at least one of the reticleand the first member before returning the second member to the firstmember.
 28. The method according to claim 26, further comprisingadjusting the first member before returning the reticle to the firstmember of the protection member.
 29. The method according to claim 26,further comprising adjusting the position of the first member and thereticle before carrying the reticle to the reticle stage.
 30. The methodaccording to claim 20, further comprising adjusting the position of thereticle and the protection member before carrying the reticle and theprotection member to the reticle stage.